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Publications
Popular Articles
- A. Belkind, S. Zarrabian, and F. Engle, Plasma Cleaning of Metals: Lubricant Oil Removal, Metal Finishing, July 1996, p.19
- K. Becker and A. Belkind, Introduction to Plasmas – Part 1, Vacuum Technology and Coating, September, 2003, p.30
- K. Becker and A. Belkind. Introduction to Plasmas - Part 2, Plasmas in Deposition Processes: Plasma Chemistry and Plasma-Wall Interactions, Vacuum Technology and Coating, January, 2004, p.
- K. Becker and A. Belkind, Introduction to Plasmas - Part 3a. Plasmas in Deposition Processes: How Plasmas Are Made, Vacuum Technology and Coating, May, 2004.
- K. Becker and A. Belkind, Introduction to Plasmas - Part 3b, Pulsed Plasmas in Deposition Processes, Vacuum Technology and Coating, January, 2006, p.33.
- K. Becker and A. Belkind, Introduction to Plasmas, Vacuum Technology and Coating, October, 2007, p.32.
- Belkind, How Plasmas Are Made, Vacuum Technology and Coating, November, 2007, p.80.
- A. Belkind and G. Tompa, DC and Pulsed DC Gas Flow Hollow Cathode Sputter-Deposition, Vacuum Technology and Coating, January, 2008, p.50.
- Belkind and K. Becker, Plasma Chemistry, Vacuum Technology and Coating, March, 2008, p.54.
- A. Belkind and S. Gershman, Plasma Diagnostics, Part I: Electrical Probe Diagnostics Techniques, Vacuum Technology and Coating, March, 2008, p.54.
- A. Belkind and K. Becker, Plasma - Wall Interaction: DC and Pulsed DC Plasmas, Vacuum Technology and Coating, May, 2008, p.58.
- A. Belkind and S. Gershman, Plasma Cleaning of Surfaces, Vacuum Technology and Coating, November 2008, p. 46.
- A. Belkind and S. Gershman, Plasma Diagnostics, Part II: Optical Emission Spectroscopy, August, 2009, p.38.
- A. Belkind and S. Gershman, Plasma Diagnostics, Part III: Laser Induced Fluorescence, Vacuum Technology and Coating, October, 2010, p.38.
- A. Belkind and S. Gershman, Deposition of Thin Films by Thermal Evaporation: Part I. Basics, Vacuum Technology and Coating, February, 2011, p.34.
- J. Katz and A. Belkind, Titanium and titanium alloy surfaces in medicine: importance of the oxide layer, Vacuum Technology and Coating, May, 2016, p.25.
- J. Katz and A. Belkind, Titanium and titanium alloy surface layer modification: plasma oxidation and oxygen plasma immersion ion implantation, Vacuum Technology and Coating, September, 2016, p.31
Some Technical Papers
1987 - 2016
- K. Memarzadeh, J.A. Woollam, and A. Belkind, Ellipsometric study of ZnO/Ag/ZnO optical coatings: Determination of layer thicknesses and optical constants, Proc. SPIE, 823, 54-61, (1987).
- K. Memarzadeh, J.A. Woollam, and A. Belkind, Variable Angle of Incidenc Spectroscopic Ellipsometric (VASE) Characterization of TiO2/Ag/TiO2 Optical Coatings, J. Appl. Phys., 64(7), 3407-3410 (1988).
- V. Koss, A. Belkind, K. Memarzadeh, and J.A. Woollam, Determination of optical constants of Ag layers in ZnO/Ag/ZnO coatings using variable angle spectroscopic ellipsometry, Solar Energy Materials, 19, 67-78 (1989).
- J.A. Dobrowolski, F.C. Ho, A. Belkind, and V.A. Koss, Merit Functions for More Effective Thin Film Calculations, Applied Optics, 28, 2824-2831 (1989).
- A. Belkind, B. Kopp and R. Sherman, Deposition of AlOxFy films using dc reactive sputtering, Thin Solid Films, 199, 279-290 (1991).
- A. Belkind, E. Ezell, W. Gerristead, Z. Orban, P. Rafalko, D. Dow, J. Felts, and R. Laird, Co-sputtering of alloys. 1. co-sputtering of oxides and nitrides using two planar magnetrons, J.Vac.Sci.Technol., A9, 530-536 (1991).
- M. Moradi, C. Nender, S. Berg, H.-O. Blom, A. Belkind, and Z. Orban, Modeling of multicomponent reactive sputtering, J.Vac.Sci.Technol., A9, 619-624 (1991).
- V.A. Koss, A. Belkind, and J.L. Vossen, Yield analysis of multilayer optical coatings, Applied Optics, 31, 960-963 (1992).
- R. Laird and A. Belkind, Co-sputtered films of mixed TiO2/SiO2, J.Vac.Sci.Technol., A 10 (1992) 1908.
- A. Belkind and Z. Orban, Magnetic biasing effects while using an unbalanced planar magnetron, J.Vac.Sci.Technol., A 11 (1993) 642-646.
- A.I. Belkind, Cosputtering and serial cosputtering using cylindrical rotatable magnetrons, J.Vac.SciTechnol., A11 (1993) 1501-1509.
- P. Carlson, S. Berg, A. Belkind, and L.V. Katardjiev, Serial co-sputtering of metals: modeling of sputtering from a periodically co-deposited surface, Surf. Coat. Technol., 61 (1993) 287-92.
- A. Belkind, S. Krommenhoek, H. Li, Z. Orban, and F. Jansen, Removal of oil from metals by plasma techniques, Surf.Coat.Technol., 68/69 (1994) 804-808.
- A. Belkind, H. Li, H. Clow, and F. Jansen, Oil removal from metals by linear multi-orifice hollow cathode, Surf.Coat.Technol, 76-77 (1995) 738.
- A. Belkind, F. Engle, and S. Zarrabian, Plasma cleaning of metals: lubricant oil removal, Metal Finishing, 94 (1996) 19.
- A. Belkind, F. Jansen, H. Li, and Z. Orban, An in situ XPS study of hollow cathode plasma cleaning and recontamination of an aluminum surface, Surf.Coat.Technol., 92 (1997) 171.
- A. Belkind and F. Jansen, Anode effects in magnetron sputtering, Surf.Coat.Technol., 99 (1998) 52.
- A. Belkind, A. Freilich, and R. Scholl, Pulse duration effects in pulse-power reactive sputtering of Al2O3, Surf.Coat.Technol., 108-109 (1998) 558.
- A. Belkind, A. Freilich, and R. Scholl, Using Pulsed DC Power for Reactive Sputtering of Al2O3., J.Vac.Sci.Technol., A 17 (1999) 1934.
- A. Belkind, Z. Zhao and R. Scholl, Dual-anode Magnetron Sputtering, Surface and Coating Technology, 163 -164 (2003) 695.
- A. Belkind, A. Freilich, G. Song, Z. Zhao, R. Scholl, and E. Bixon, Mid-Frequency Reactive Sputtering of Dielectrics: Al2O3, Surface and Coating Technology, 174-175 (2003) 88.
- A. E. Delahoy, S. Y. Guo, C. Paduraru and A. Belkind, Reactive-environment, hollow cathode sputtering: Basic characteristics and application to Al2O3, doped ZnO, and In2O3:Mo, J. Vac. Sci. Technol. A 22 (2004) 1697.
- A Belkind, A Freilich, J Lopez, Z Zhao, W Zhu and K Becker, Characterization of pulsed dc magnetron sputtering plasmas, New Journal of Physics, 7 (2005) 90.
- J. Lopez, W. Zhu, A. Freilich, A. Belkind, and K. Becker, Optical Emission From Pulsed DC Magnetron Sputtering Plasmas, IEEE Transactions on Plasma Science, 33 (2005) 348.
- J. Lopez, W. Zhu, A. Freilich, A. Belkind, and K. Becker, Time-resolved optical emission spectroscopy of pulsed DC magnetron sputtering plasmas, J. Phys. D: Appl. Phys. 38 (2005) 1.
- A. Belkind, A. Freilich, and K Becker, Characterization of pulsed sputtering plasmas, New Journal of Physics, 7 (2005) 90.
- J. Lopez, W. Zhu, A. Freilich, A Belkind, and K Becker, Optical emission from pulsed dc magnetron sputtering plasmas, IEEE Transactions on Plasma Science, 33 (2005) 348.
- J. Lopez, W. Zhu, A. Freilich, A Belkind, and K Becker, Time-resolved optical emission spectroscopy of pulsed DC magnetron sputtering plasmas, J. Phys. D: Appl. Phys. 38 (2005) 1769.
- A. Belkind, W. Zhu, J. Lopez, and K Becker, Time-resolved optical emission spectroscopy during pulsed dc magnetron sputter deposition of Ti and TiO2 thin films, Plasma Sources Sci. Technol. 15 (2006) S17.
- W. Zhu, G. Buyle, J. Lopez, S. Shanmugmurthy, A. Belkind, K. Becker, and R. De Gryse, Plasma emission redistribution in a single cycle of a pulsed dc magnetron, New Journal of Physics, 8 (2006) 146.
- S. Gershman, O. Mozgina, A. Belkind, K. Becker, and E. Kunhardt, Electrical Discharges in Bubbled Water., Contrib. Plasma Phys. 46 (2007) 19.
- C. Paduraru, K.H. Becker, A. Belkind, J.L. Lopez, Y.A. Gonzalvo, Characterization of the Remote Plasma Generated in a Pulsed-DC Gas-Flow Hollow-Cathode Discharge, IEEE Transactions on Plasma Physics, 35 (2007) 527.
- O. Mozgina, A. Koutsospyros, S. Gershman, A. Belkind, C. Christodoulatos, and K. Becker, Decomposition of Energetic Compounds by Pulsed Electrical Discharges in Gas-Bubbled Aqueous Solutions, IEEE Trans. Plasma Sci. 37, 905-910 (2009).
- S. Gershman, A. Belkind, and K. Becker, Optical emission diagnostics of the plasma channel in a pulsed electrical discharge in a gas bubble, IEEE Transactions Pulsed Power, Pulsed Power Conference, (2009) 838-843.
- S. Gershmana and A. Belkind, Time-resolved processes in a pulsed electrical discharge in argon bubbles in water, Eur. Phys. J. D 60 (2010) 661-672.
- Nokes, T. J., Hausmann, R.G.M., VanLehn, K., & Gershman, S. (2011). Testing the instructional fit hypothesis: The case of self-explanation prompts. Instructional Science, 39 (pp. 645-666)
- S. Gershman, S. Zwicker, A Belkind, Pulsed electrical discharge propagation along the surface of liquid dielectricts, Pulsed Power Conference (PPC), (2013) 19th IEEE , vol. 1, no. 4, pp.16-21 June 2013
- S. A. Wissel1, A. Zwicker1, J. Ross, S. Gershman, The use of dc glow discharges as undergraduate educational tools, Am. J. Phys. 81, 663 (2013).
- J. Katz, S. Gershman, A. Belkind, Optical Emission Spectroscopy and Contact Angle Study of Plasma Cleaning of Titanium Alloy Surfaces: Argon Plasma, Plasma Medicine, 5 (2015) 223–236.
- S. Gershman, Y. Raitses, Unstable Behavior of Anodic Arc Discharge for Synthesis of Nanomaterials, J. Phys. D: Appl. Phys. 49 (2016) 345201 (9pp)
Patents
- V.V. Aleksandrov, K.A. Balodis, and A.I. Belkind, High quantum yield photoelectron amplifier photocathode and contains tetra-seleno-tetracene and metalic caesium, SU 775786, Jan. 11, 1980.
- A.I. Belkind, E. Bjornard, J.J. Hofmann, Donald V. Jacobson, and S.J. Nadel, Transparent Coatings by Reactive Sputtering, US, 4,769,291; Sep. 6, 1988.
- A.I. Belkind, D.B. Dow, J.T. Felts, M.R. Kirs, R.E. Laird, S.C. Schulz, Co-sputtering homogeneous deposits on large moving substrate - using 2 parallel rotating tubular targets so positioned that material from each is deposited onto other before transfer to substrate, WO 9201081, Jan. 23, 1992
- A.I. Belkind, C. Boehmler, M.R. Kirs, J.R. Kurie, and Z. Orban, Cylindrical Magnetron Shield Structure, US 5108574, Apr. 28, 1992.
- A. Belkind, L. Wamboldt, and J. Wolfe, Device and Method for Depositing Metal Oxide Films, US 5338422, Apr. 16, 1994.
- J.D. Wolfe, A. Belkind, and R. Laird, Durable Low-Emissivity Solar Control Thin Film Coating, US 5377045, Dec.27, 1994.
- A. Belkind, F. Jansen, S.K. Krommenhoek, and Z. Orban, Hollow cathode array for plasma generation in substrate surface treatment - has plasma generated in housing with several spaced openings in wall, EP 634778, Jan. 18, 1995.
- J.D. Wolfe, A. Belkind, and R. Laird, Durable Low-Emissivity Solar Control Thin Film Coating, US 5,563,734, Oct.8, 1996.
- J. Countrywood, A. Belkind, Z. Zarrabian, C. Sherwood, and F. Jansen, Plasma treating apparatus, EP 818801, Apr. 07, 1997
- A. Belkind, F. Jansen, S.K. Krommenhoek, and Z. Orban, Hollow cathode array for plasma generation in substrate surface treatment - has plasma generated in housing with several spaced openings in wall, US 5,627,435, May 6, 1997.
- J. Countrywood, Z. Zarrabian, A. I. Belkind C. Sherwood, and F. Jansen, Plasma apparatus and method, US 6,110,540, Aug. 29, 2000.
- R. Scholl and A. Belkind, Method and Apparatus for substrate biasing in multiple electrode sputtering systems, US 6,818,103, November 16, 2004; WO 01/29278 A1, April 26, 2001.
- F. Jansen, R.A. Hougle, R.C. Paciej, E.F. Ezzel, A.I. Belkind, P.A. Stockman, K.W. Cross, and R.E. Doxstader, Process for cleaning and/or passivating of the inner surfaces of a cylindrical gas cylinder by means of a plasma, EP 1186353, 2002
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